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Phenolic Resin for Photoresist

机译:光刻胶用酚醛树脂

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摘要

Lithography is an important technique for the elecronic industries. In the manufacture of a semiconductor and a liquid crystal display (LCD), photoresist is used as a key photo sensitive material. An example is a phenolic as a base resin that controls photoresist characters and plays an active part in the electronic industries. This review describes the results of investigation on the published reports and patents which are concerned with the phenolic photoresists. Kettle materials for a reaction vessel are also introduced for obtaining a specific phenolic resin which is controlled to an extremely low metal content of ppb level, and manufacturing methods for obtaining a phenolic resin with low-dispersed molecular weight.
机译:光刻是电子工业的一项重要技术。在半导体和液晶显示器(LCD)的制造中,光刻胶被用作关键的光敏材料。一个例子是酚醛树脂作为基础树脂,可控制光致抗蚀剂的特性并在电子工业中发挥重要作用。这篇综述描述了与酚类光刻胶有关的已发表的报告和专利的调查结果。还引入用于反应容器的水壶材料,以得到控制为ppb水平的极低金属含量的特定酚醛树脂,以及用于获得具有低分散分子量的酚醛树脂的制造方法。

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