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首页> 外文期刊>Journal of the Taiwan Institute of Chemical Engineers >Effects of electrodeposition synthesis parameters on the photoactivity of nanostructured tungsten trioxide thin films: Optimisation study using response surface methodology
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Effects of electrodeposition synthesis parameters on the photoactivity of nanostructured tungsten trioxide thin films: Optimisation study using response surface methodology

机译:电沉积合成参数对纳米结构三氧化钨薄膜光活性的影响:使用响应面法的优化研究

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The main aim of this study was to synthesize and characterise nanostructured tungsten trioxide (WO3) thin films via electrodeposition and subsequently, optimise the electrodeposition synthesis parameters using response surface methodology (RSM). Statistical Box-Behnken RSM design was used to investigate and optimise the effects of four independent electrodeposition synthesis parameters, namely: deposition time, precursor tungsten (W) concentration, annealing temperature and pH. In addition, the synergistic interaction between different electrodeposition synthesis parameters was identified and quantified in enabling a higher photoactivity achievable by nanostructured WO3 thin films. Resultant nanostructured WO3 thin films were characterised using field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD) and photocurrent density measurements under one-Sun irradiation. From the electrodeposition synthesis process, it was found that there was a gradual increase in the nanocrystallites WO3 size from 30 nm to 70 nm when the annealing temperature was varied between 400 degrees C and 600 degrees C. XRD results verified the existence of the same photoactive phase of monoclinic WO3 with increasing annealing temperature with the preferred growth orientation along the (002) planar. Whilst from the Box-Behnken RSM design, it was found that the optimum deposition time, precursor W concentration, annealing temperature and pH were: 60 min, 0.15 mol/L, 600 degrees C, and pH 1.0, respectively. The highest photocurrent density of 120 mu A/cm(2) was measured at 1 V (versus Ag/AgCl) for nanostructured WO3 thin film synthesized at the optimum conditions as informed by the Box-Behnken RSM. Further analysis and validation of the Box-Behnken RSM model using analysis of variance (ANOVA) revealed that the RSM-derived statistical predictive model was robust, adequate and representative to correlate the various electrodeposition synthesis parameters to photocurrent density. This study highlights the importance to systematically optimise the electrodeposition synthesis parameters in order to achieve a higher photocurrent density on nanostructured WO3 thin film for sustainable hydrogen production from photoelectrochemical water splitting reaction. (C) 2015 Taiwan Institute of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
机译:这项研究的主要目的是通过电沉积合成和表征纳米结构的三氧化钨(WO3)薄膜,然后使用响应表面方法(RSM)优化电沉积合成参数。统计Box-Behnken RSM设计用于研究和优化四个独立电沉积合成参数的影响,这些参数分别是:沉积时间,前驱体钨(W)浓度,退火温度和pH。另外,鉴定并量化了不同电沉积合成参数之间的协同相互作用,以使得可以通过纳米结构的WO3薄膜实现更高的光活性。使用场发射扫描电子显微镜(FE-SEM),X射线衍射(XRD)和在单太阳照射下的光电流密度测量来表征所得的纳米结构WO3薄膜。从电沉积合成过程中发现,当退火温度在400摄氏度和600摄氏度之间变化时,纳米晶体WO3的尺寸从30 nm逐渐增加到70nm。XRD结果验证了相同光敏性的存在。单晶WO3的第一相,随着退火温度的升高,沿(002)平面的生长方向优选。从Box-Behnken RSM设计中,发现最佳沉积时间,前驱体W浓度,退火温度和pH分别为:60分钟,0.15 mol / L,600℃和pH 1.0。如Box-Behnken RSM所知,对于在最佳条件下合成的纳米结构WO3薄膜,在1 V(相对于Ag / AgCl)下测得的最高光电流密度为120 mu A / cm(2)。 Box-Behnken RSM模型使用方差分析(ANOVA)的进一步分析和验证表明,RSM派生的统计预测模型是可靠,充分且具有代表性的,可将各种电沉积合成参数与光电流密度相关联。这项研究强调了系统优化电沉积合成参数的重要性,以便在纳米结构的WO3薄膜上实现更高的光电流密度,以实现光电化学水分解反应可持续制氢。 (C)2015台湾化学工程师学会。由Elsevier B.V.发布。保留所有权利。

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