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Optimization of the diffraction efficiency of Bi12SiO2 under strong modulation and applied electric fields

机译:强调制和外加电场作用下Bi12SiO2衍射效率的优化

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To optimize the diffraction efficiency of Bi12SiO2 we studied the influence on that efficiency of three physical parameters (thickness of the sample, applied de held, and light modulation depth m). We calculated the diffraction efficiency by using the refractive-index variation along the thickness of the sample and numerically solving the beam-coupling equations (for recording and reading). We found that for given values of m and the applied field there is an optimum thickness for which the diffraction efficiency is maximum. Diffraction efficiencies of 95% were obtained for high Values of the light-modulation depth (m = 1) and strong electric fields (20 kV/cm). (C) 2000 Optical Society of America [S0740-3224(00)02211-6] OCIS codes: 050.0050, 050.1940. [References: 19]
机译:为了优化Bi12SiO2的衍射效率,我们研究了三个物理参数(样品的厚度,施加的保持力和光调制深度m)对效率的影响。我们通过使用沿样品厚度的折射率变化并通过数值求解光束耦合方程(用于记录和读取)来计算衍射效率。我们发现,对于给定的m值和所施加的场,存在最佳衍射效率最大的厚度。高值的光调制深度(m = 1)和强电场(20 kV / cm)可获得95%的衍射效率。 (C)2000美国光学学会[S0740-3224(00)02211-6] OCIS代码:050.0050,050.1940。 [参考:19]

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