首页> 外文期刊>Journal of the Optical Society of America, B. Optical Physics >Direct measurement of 248- and 193-em excimer-induced densification in silica-germania waveguide blanks
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Direct measurement of 248- and 193-em excimer-induced densification in silica-germania waveguide blanks

机译:直接测量二氧化硅和德国锗波导毛坯中248和193em受激准分子诱导的致密化

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The densification of a waveguide blank of composition 14GeO_2:86SiO_2 produced by 193- and 248-em excimer exposure was measured by an interferometric technique. With the aid of a finite-element model, we derive the unconstrained densification from the experimentally determined optical phase shift. The densification versus exposure can be fitted to a power law and is compared with the behavior of fused silica. Again, with the finite-element model, an estimate is made of the refractive-index change that would be produced in a single-mode fiber. For the exposure levels typically used for the 248-em exposure, the densification contribution to the optical index change is found to be negligible for this composition. On the other hand, for the high 193-em exposure, the densification contribution can be dominant.
机译:通过干涉法测量了通过193-em和248-em受激准分子曝光产生的组成14GeO_2:86SiO_2的波导毛坯的致密化。借助有限元模型,我们从实验确定的光学相移中获得了无约束的致密化。致密化与曝光的关系可以拟合幂律,并与熔融石英的行为进行比较。同样,利用有限元模型,可以估算单模光纤中将产生的折射率变化。对于通常用于248-em曝光的曝光量,发现对于该组合​​物,致密化对光学指数变化的贡献可忽略不计。另一方面,对于193em高曝光量,致密化作用可能占主导。

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