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首页> 外文期刊>Journal of the European Ceramic Society >High temperature oxidation of SiC under helium with low-pressure oxygen. Part 2: CVD β-SiC
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High temperature oxidation of SiC under helium with low-pressure oxygen. Part 2: CVD β-SiC

机译:用低压氧气在氦气下高温氧化SiC。第2部分:CVDβ-SiC

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In the frame of the Generation IV International Forum, Gas-cooled Fast Reactor (GFR) is one system studied by CEA (France). Helium pressurized at 7 MPa is the coolant and the nominal temperature of use is about 1300 K. The cladding materials currently considered is a SiC/SiC composite with a β-SiC coating. In case of accident, reactor temperatures can reach 1900-2300 K. A previous study was carried out to determine the physico-chemical behavior of another polytype, α-SiC, for comparison on the position of the active to passive transition and of the mass loss rates under active conditions to simulate a typical accident. Experimental oxidation tests at high temperature (1400-2300 K) on massive β-SiC samples processed by Chemical Vapor Deposition (CVD) coupled to mass variation, SEM, XPS, AFM and roughness analyses enabled to determine the transition between passive and active oxidation regimes, and to study the resistance to oxidation of such material in some conditions that might be encountered in case of accident (high temperature increase up to 2300 K). Finally, the experimental results have shown that the transition from passive to active regime occurs at higher temperature for β-SiC than for α-SiC and that the mass loss rate of β-SiC is lower than the one measured for α-SiC on the common temperature range investigated (up to 2100 K).
机译:在第四代国际论坛的框架内,气冷快堆(GFR)是CEA(法国)研究的一种系统。在7 MPa压力下加压的氦是冷却剂,使用的标称温度约为1300K。目前考虑的包覆材料是具有β-SiC涂层的SiC / SiC复合材料。万一发生事故,反应堆温度可达到1900-2300K。进行了一项先前的研究,以确定另一种多晶型α-SiC的物理化学行为,以比较主动到被动转变的位置和质量。在活动条件下的损失率,以模拟典型事故。通过化学气相沉积(CVD)处理的大量β-SiC样品在高温(1400-2300 K)上进行的实验氧化测试,结合质量变化,SEM,XPS,AFM和粗糙度分析,可以确定被动和主动氧化方式之间的过渡,并研究这种材料在某些情况下可能发生的事故(高温升高至2300 K)时的抗氧化性。最后,实验结果表明,β-SiC比α-SiC在更高的温度下发生从被动状态到主动状态的转变,并且β-SiC的质量损失率低于α-SiC的质量损失率。研究了常见温度范围(最高2100 K)。

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