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Local electrochemical studies of the microstructural corrosion of A1Cu_4Mg1 as-cast aluminium alloy and influence of applied strain

机译:A1Cu_4Mg1铸态铝合金组织腐蚀的局部电化学研究及施加应变的影响

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摘要

The microstructure of A1Cu4Mg1 as-cast alu_minium alloy was first determined by means of field emission-scanning electron microscope with an integrated electron dispersion spectrometer, secondary ion mass spectroscopy and atomic force microscopy. Large precip_itates (Al_2Cu, Al-Si-Mn-Fe-Cu, oxides) were located at grain boundaries, whereas small particles (aluminium, magnesium and copper) were present in grains. The electrochemical response and pitting susceptibility of sites containing precipitates were then investigated after polish_ing using the electrochemical microcell technique. After straining, big scattering was observed in the electrochem_ical response. The most active places corresponded to the sites containing wide microcracks and severe damages in the matrix. In this case, the corrosion potential was around -1,000 mV vs. Ag/AgC1, and the current in the passive domain was five times higher than on the strained matrix. In the absence of severe damage in the matrix or wide microcracks, the corrosion potential was more anodic and the current density in the passive range was around 0.5 mA cm~(-2). Local polarisation curves carried out in sites containing large precipitates and no defects induced by straining were very close to those obtained in grains far from precipitates.
机译:首先通过具有集成电子弥散光谱仪的场发射扫描电子显微镜,二次离子质谱和原子力显微镜来确定AlCu4Mg1铸铝合金的显微组织。大的沉淀物(Al_2Cu,Al-Si-Mn-Fe-Cu,氧化物)位于晶界,而小颗粒(铝,镁和铜)存在于晶粒中。然后使用电化学微电池技术在抛光后研究了含有沉淀物的位点的电化学响应和点蚀敏感性。过滤后,在电化学反应中观察到大的散射。最活跃的位置对应于在基质中包含宽微裂纹和严重损坏的位置。在这种情况下,腐蚀电位相对于Ag / AgCl约为-1,000 mV,并且在被动区域中的电流是在应变基体上的五倍。在没有严重破坏基体或宽微裂纹的情况下,腐蚀电位更呈阳极,无源范围内的电流密度约为0.5 mA cm〜(-2)。在含有大的析出物且没有应变引起的缺陷的部位进行的局部极化曲线非常接近在远离析出物的晶粒中获得的那些。

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