首页> 外文期刊>Journal of Solid State Chemistry >Role of dopants in LiF:Mg,Cu, LiF:Mg,P and LiF:Mg,Cu,P detectors
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Role of dopants in LiF:Mg,Cu, LiF:Mg,P and LiF:Mg,Cu,P detectors

机译:掺杂剂在LiF:Mg,Cu,LiF:Mg,P和LiF:Mg,Cu,P检测器中的作用

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摘要

In this study, electronic structure of LiF crystal doped with Mg,Cu,P impurities was studied with WIEN2k code on the basis of FPLAPW+lo method. Results show that in Mg-doped LiF composition, an electronic trap was created with impurity concentration of 1.56% and 3.125%. In this condition, the electronic trap with increasing the percentage of the impurities up to 4.687% is annihilated. It was found, that by doping of Mg and Cu or P simultaneously, a hole-trap is created in valence band. It was realized that in LiF:Mg,Cu, LiF:Mg,P and LiF:Mg,Cu,P, Cu impurity and Li atom, have a key role in creation of levels which lead to create electronic and hole traps. Mg impurity and F atom, only have a role in creation of electronic traps. In addition, P impurity has a main role in creation of the electronic and hole traps in LiF:Mg,Cu,P. The activation energy of electronic and hole trap in LiF:Mg,Cu, LiF:Mg,P and LiF:Mg,Cu,P crystalline lattice were obtained as 0.3 and 5.5 eV, 0.92 and 3.4 eV and 0.75 and 3.1 eV, respectively.
机译:本研究以FPLAPW + lo法为基础,采用WIEN2k编码研究了掺有Mg,Cu,P杂质的LiF晶体的电子结构。结果表明,在掺Mg的LiF中,形成了电子陷阱,杂质浓度为1.56%和3.125%。在这种情况下,将使杂质百分比增加到4.687%的电子陷阱被消灭。已经发现,通过同时掺杂Mg和Cu或P,在价带中产生空穴陷阱。已经认识到,在LiF:Mg,Cu,LiF:Mg,P和LiF:Mg,Cu,P,Cu杂质和Li原子中,在形成能产生电子陷阱和空穴陷阱的能级中具有关键作用。镁杂质和F原子仅在电子陷阱的产生中起作用。此外,P杂质在LiF:Mg,Cu,P中的电子陷阱和空穴陷阱的产生中起主要作用。 LiF:Mg,Cu,LiF:Mg,P和LiF:Mg,Cu,P晶格中电子和空穴陷阱的活化能分别为0.3和5.5 eV,0.92和3.4 eV和0.75和3.1 eV。

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