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首页> 外文期刊>Journal of Nuclear Materials: Materials Aspects of Fission and Fusion >The electrochemistry of zirconium in aqueous solutions at elevated temperatures and pressures
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The electrochemistry of zirconium in aqueous solutions at elevated temperatures and pressures

机译:高温高压下水溶液中锆的电化学

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The electrochemistry of zirconium has been explored in borate buffer solution of pH = 6.94 at 250 degrees C with and without hydrogen by measuring the current, impedance, and capacitance as a function of potential. Data are interpreted in terms of modified point defect models (PDM) that recognize the existence of a thick oxide outer layer over a thin barrier layer. From thermodynamic analysis, it is postulated that a hydride barrier layer forms under PWR coolant conditions whereas an oxide barrier layer forms under BWR primary coolant conditions. Thus, the introduction of hydrogen into the solution lowers the corrosion potential of zirconium to the extent that the formation of ZrH2 is predicted to be spontaneous rather than the ZrO2. Mott-Schottky analysis shows that the passive film formed on zirconium is n-type, which is consistent with the PDM, corresponding to a preponderance of oxygen/hydrogen vacancies and/or zirconium interstitials in the barrier layer. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过测量电流,阻抗和电容随电势的变化,在pH = 6.94的硼酸盐缓冲溶液中(含氢和不含氢)在250摄氏度下探索了锆的电化学。根据修改的点缺陷模型(PDM)来解释数据,该模型识别出薄的势垒层上存在厚的氧化物外层。根据热力学分析,推测在PWR冷却剂条件下会形成氢化物阻挡层,而在BWR初级冷却剂条件下会形成氧化物阻挡层。因此,将氢引入到溶液中降低了锆的腐蚀潜力,达到了预测的ZrH2形成是自发的而不是ZrO2的程度。莫特-肖特基(Mott-Schottky)分析表明,锆上形成的钝化膜为n型,与PDM一致,对应于势垒层中大量的氧/氢空位和/或锆间隙。 (c)2005 Elsevier B.V.保留所有权利。

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