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首页> 外文期刊>Journal of nonlinear optical physics & materials >Raman approach in porous silicon at 1.5 mu m
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Raman approach in porous silicon at 1.5 mu m

机译:拉曼方法在1.5微米的多孔硅中

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摘要

In the last years, the possibility of light generation and/or amplification in silicon, based on Raman emission, has achieved great results. However, some significant limitations, inherent to the physics of silicon, have been pointed out, too. In order to overcome these limitations, a possible option is to consider low dimensional silicon. Along this line of argument, an approach based on Raman scattering in porous silicon is presented. We prove two significant advantages with respect to silicon: the broadening of spontaneous Raman emission and the tuning of the Stokes shift. Finally, we discuss the prospect of Raman amplifier in porous silicon.
机译:近年来,基于拉曼发射的硅中的光产生和/或放大的可能性已经取得了很大的成果。但是,也指出了硅物理学固有的一些重要限制。为了克服这些限制,可能的选择是考虑使用低尺寸的硅。沿着这种观点,提出了一种基于拉曼散射的多孔硅方法。我们证明了关于硅的两个重要优点:自发拉曼发射的扩大和斯托克斯频移的调整。最后,我们讨论了在多孔硅中拉曼放大器的前景。

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