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Kinetic Analysis of Nonisothermal Reduction of Silica-Supported Nickel Catalyst Precursors in a Hydrogen Atmosphere

机译:氢气氛中二氧化硅负载的镍催化剂前体非等温还原的动力学分析

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摘要

A series of silica-supported nickel catalyst precursors was synthesized with different SiO2/Ni molar ratios. Reduction of Ni catalyst precursors with different SiO2/Ni molar ratios under a hydrogen atmosphere was investigated at different heating rates. Kinetic parameters were determined using Kissinger-Akahira-Sunose isoconversional and invariant kinetic parameter methods. It was found that for all molar ratios, the apparent activation energy (E-a) is practically constant in the conversion range of 0.20 <= alpha <= 0.80. In the considered conversion range, following values of E-a were found: 134.5 kJ mol(-1) (SiO2/Ni = 0.20), 139.6 kJ mol(-1) (SiO2 /Ni = 0.80), and 128.3 kJ mol(-1) (SiO2/Ni = 1.15). It was established that the reduction of Ni catalyst precursors with different SiO2/Ni molar ratios is a complex process and can be described by the Sestak-Berggren autocatalytic model. It was found that the reaction is more Langmuir-Hinshelwood type, as hydrogen dissociates rapidly on surface nuclei and the dissociated hydrogen reacts with the Ni-O active system. It was concluded that the reduction process proceeds through bulk nucleation, which is a dominant mechanism, where three-dimensional growth of crystals with polyhedron-like morphology exists. It was found that the Ni/Si ratio decreases after the reduction process. This has been explained by low Ni and higher Si surface concentrations. It has been disclosed that Ni dispersion decreases.
机译:合成了具有不同SiO2 / Ni摩尔比的一系列二氧化硅负载的镍催化剂前体。研究了在不同加热速率下在氢气气氛下还原具有不同SiO2 / Ni摩尔比的Ni催化剂前体的方法。使用Kissinger-Akahira-Sunose等转化和不变动力学参数方法确定动力学参数。发现对于所有摩尔比,表观活化能(E-a)在0.20≤α≤0.80的转化率范围内实际上是恒定的。在考虑的转换范围内,发现以下Ea值:134.5 kJ mol(-1)(SiO2 / Ni = 0.20),139.6 kJ mol(-1)(SiO2 / Ni = 0.80)和128.3 kJ mol(-1) )(SiO 2 /Ni=1.15)。已经确定具有不同SiO 2 / Ni摩尔比的Ni催化剂前体的还原是复杂的过程,并且可以通过Sestak-Berggren自动催化模型来描述。发现该反应是更朗格缪尔-欣谢尔伍德型的,因为氢在表面核上迅速解离并且解离的氢与Ni-O活性体系反应。可以得出结论,还原过程是通过本体成核过程进行的,这是一个主要机制,存在具有多面体状形态的晶体的三维生长。发现在还原过程之后Ni / Si比降低。低镍和高硅表面浓度可以解释这一点。已经公开了Ni分散降低。

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