Analysis of near-field subwavelength focusing of hybrid amplitude-phase Fresnel zone plates under radially polarized illumination

摘要

The near-field focusing properties of actual hybrid amplitude-phase binary subwavelength Fresnel zone plates (HBSFZPs) are studied theoretically. The analysis based on the exact vector angular spectrum method is done for a radially polarized beam incident on the HBSFZPs. The results show that the near-field subwavelength focusing with a long depth of focus can be obtained using an HBSFZP, which is very useful for near-field subwavelength photolithography and high-resolution microscopy. The position of the actual focus in the near-field focusing HBSFZPs depends on the evanescent wave rather than the propagating wave. The etch depth has an important influence on focusing properties of HBSFZPs.