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首页> 外文期刊>Journal of optical technology >Device for analyzing nanoroughness and contamination on a substrate from the dynamic state of a liquid drop deposited on its surface
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Device for analyzing nanoroughness and contamination on a substrate from the dynamic state of a liquid drop deposited on its surface

机译:用于根据沉积在其表面上的液滴的动态状态分析基底上的纳米粗糙度和污染的设备

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摘要

A method of rapid monitoring of the degree of surface cleanliness of substrates intended to form the microrelief of diffraction optical elements is developed in this article. A method for monitoring the nanoroughness and degree of surface cleanliness from the dynamic state of a liquid drop has been developed and patented. The results of experiments on estimating the behavior of a liquid drop, obtained by means of a high-speed video camera, are presented. The device is used to efficiently correct the final cleaning process of dielectric substrates.
机译:本文开发了一种快速监控旨在形成衍射光学元件微浮雕的基材表面清洁度的方法。已经开发了一种从液滴的动态状态监测纳米粗糙度和表面清洁度的方法,并已申请专利。给出了通过高速摄像机获得的估计液滴行为的实验结果。该设备用于有效地校正电介质基板的最终清洁过程。

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