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Relaxation of silica glass surfaces before and after stress modification in a wet and dry atmosphere: molecular dynamics simulations

机译:在干湿环境中进行应力改性前后的石英玻璃表面松弛:分子动力学模拟

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Previous molecular dynamics simulations have shown that compression of silica glass surfaces occurs upon formation of an interface with a model crystal and that a structural change caused by this process is retained after glass and crystal are separated. The remnant structural modification caused by this stress was an increase in the concentration of siloxane bond angles less than 150 degrees in the near surface region of the glass, It was expected that the structural modification associated with interface formation and separation could represent an increase in the concentration of less stable siloxane bonds, particularly in the presence of water molecules. It was also recognized that a decreased stability could indicate greater reactivity with water molecules. Thus, water reaction on silica surfaces was simulated before and after stress modification and the subsequent structural relaxations in the glass surface were observed. Decreased stability, represented by a greater number of bond ruptures, existed after interface formation and removal. These bond ruptures were Si-O bonds breaking and reforming siloxane bonds with an angle nearer the average and also Si-O bonds breaking to react with water forming silanols, A greater number of silanols formed after interface formation and removal than before, demonstrating a greater reactivity with water after interface formation and separation. (C) 1998 Elsevier Science B.V. All rights reserved. [References: 35]
机译:先前的分子动力学模拟表明,二氧化硅玻璃表面的压缩在与模型晶体形成界面时发生,并且在玻璃和晶体分离后,由该过程引起的结构变化得以保留。由该应力引起的残余结构改性是在玻璃的近表面区域中硅氧烷键角浓度的增加小于150度,预期与界面形成和分离相关的结构改性可能代表玻璃中的增加。浓度较低的硅氧烷键,尤其是在水分子存在的情况下。还认识到,降低的稳定性可能表明与水分子的反应性更高。因此,模拟了在应力改变之前和之后在二氧化硅表面上的水反应,并观察到玻璃表面随后的结构松弛。界面形成和去除后,存在稳定性下降,表现为键断裂数量增加。这些键断裂是:Si-O键断裂并以接近平均角度的方式重整硅氧烷键,Si-O键断裂以与水反应形成硅烷醇。形成和除去界面后形成的硅烷醇数量比以前多,这表明界面形成和分离后与水的反应性。 (C)1998 Elsevier Science B.V.保留所有权利。 [参考:35]

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