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Study of a-SiGe : H films and n-i-p devices used in high efficiency triple junction solar cells

机译:高效三结太阳能电池用a-SiGe:H薄膜和n-i-p器件的研究

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We report our systematic studies on a-SiGe:H thin films and n-i-p solar cells for GeH4/Si2H6, ratio varying from 1.43 to 0. This results in a variation of band gap from 1.37 to 1.84 eV. The FTIR studies show that the total hydrogen content in these films decreases as Ge content increases, For Ge rich films, the hydrogen also goes in to Ge-H mode. I-V measurements on n-i-p solar cells with i-layer having different Ge content show that as Ge content increase, Short circuit current (J(sc)) increases, whereas open circuit voltage (V-oc) fill factor (FF) and conversion efficiency (eta) decrease. For Ge rich films, J(sc) does not significantly increase after GeH4/Si2H6 ratio increases beyond 0.72; however V-oc, FF and eta decrease drastically. The quantum efficiency (QE) measurements in the subgap absorption range show that band gap and Urbach slope of the i-layer can very well be estimated in the devices. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 9]
机译:我们报告了我们对a-SiGe:H薄膜和n-i-p太阳能电池GeH4 / Si2H6的系统研究,比率从1.43到0。这导致带隙从1.37到1.84 eV变化。 FTIR研究表明,这些膜中的总氢含量随Ge含量的增加而降低。对于富Ge膜,氢也进入Ge-H模式。对具有不同Ge含量的i层的辊隙太阳能电池的IV测量表明,随着Ge含量的增加,短路电流(J(sc))增大,而开路电压(V-oc)填充因子(FF)和转换效率( eta)减少。对于富含锗的薄膜,在GeH4 / Si2H6之比增加到0.72以上之后,J(sc)不会显着增加;但是V-oc,FF和eta急剧下降。在亚间隙吸收范围内的量子效率(QE)测量表明,可以很好地估计i层的带隙和Urbach斜率。 (C)2002 Elsevier Science B.V.保留所有权利。 [参考:9]

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