Indentation and Scratch Tests on Sputtered Amorphous CN_x Films Deposited on Plasma-Nitrided Ti-6Al-4V

摘要

Sputtered carbon nitride (CN_x) films were deposited on both untreated and plasma-nitrided Ti-6Al-4V substrates. Surface and cross-section morphology of the deposited CN_x films was studied by scanning electron microscopy (SEM). Modified Vickers hardness tests showed that the intrinsic hardness of the CN_x film was about HV 2000 to 3000. Both the indentation and scratch tests showed that, compared with the CN_x film deposited on Ti-6Al-4V substrate, the load-bearing capacity of CN_x film deposited on a plasma-nitrided layer was improved dramatically. From the results of scratch tests, the duplex-treated system was effective in maintaining a favorable low and stable coefficient of friction and improving the wear resistance of Ti-6Al-4V substrate.