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Gallium-doped VPO catalysts for the oxidation of n-butane to maleic anhydride

机译:镓掺杂VPO催化剂,用于将正丁烷氧化为马来酸酐

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Vanadium phosphate (VPO) catalyst materials have been doped with gallium and subsequently tested for the mild oxidation of n-butane to maleic anhydride. At low Ga concentrations, this impurity is shown to be beneficial for n-butane conversion. For low dopant levels (Ga/V <= 1 at%), the crystallinity of the hemihydrate (VOHPO4 center dot 0.5H(2)O) precursor phase is improved and its specific area is increased relative to the undoped material as a result of decreased platelet thickness. Electron diffraction and energy dispersive X-ray analysis (XEDS) revealed that the Ga is uniformly distributed in a substitutional manner throughout the hemihydrate structure. The presence of Ga also significantly shortens the activation time required to convert the hemihydrate precursor into a well crystallized vanadyl pyrophosphate (VO)(2)P2O7 phase under an n-butane/air gas flow at 400 degrees C. The intimate presence of Ga distributed within the VOHPO4 center dot 0.5H(2)O unit cell has also been confirmed by XANES and EXAFS. Such studies also show that the Ga is partially redistributed within the (VO)(2)P2O7 structure after catalyst activation. A complementary electrical conductivity study on these materials revealed that Ga3+ substitutes for (VO)(2+) species in (VO)(2)P2O7 giving rise to an n-type semiconductivity which partially compensates the natural p-type conductivity character of the (VO)(2)P2O7 phase. For higher Ga doping levels (Ga/V approximate to 5 at%), the excess of Ga concentrates as a GaPO4 impurity phase, which is shown to have a detrimental effect on the catalytic performance of the Ga-doped VPO catalyst.
机译:磷酸钒(VPO)催化剂材料已掺有镓,随后进行了正丁烷向氧化马来酸酐的轻度氧化测试。在低Ga浓度下,该杂质显示出对正丁烷转化有利。对于低掺杂水平(Ga / V <= 1 at%),半水合物(VOHPO4中心点0.5H(2)O)前体相的结晶度得到改善,并且相对于未掺杂的材料,其比表面积增加了血小板厚度减少。电子衍射和能量色散X射线分析(XEDS)表明,Ga以取代方式均匀分布在整个半水合物结构中。 Ga的存在还显着缩短了将半水合物前体在400摄氏度的正丁烷/空气气流下转化为结晶良好的钒酸焦磷酸钒(VO)(2)P2O7相所需的活化时间。 XOHES和EXAFS还确认了VOHPO4中心点0.5H(2)O晶胞内的内含子。此类研究还表明,催化剂活化后,Ga在(VO)(2)P2O7结构内部分重新分布。对这些材料的补充电导率研究表明,Ga3 +替代了(VO)(2)P2O7中的(VO)(2+)物种,从而产生了n型半导电性,部分补偿了( VO)(2)P2O7相。对于更高的Ga掺杂水平(Ga / V约为5 at%),过量的Ga会浓缩成GaPO4杂质相,这显示出对掺杂Ga的VPO催化剂的催化性能有不利影响。

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