Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent

摘要

The particular challenge of micropatterning organic materials has stimulated numerous approaches for making effective and repeat-able patterned structures with fine features.Among all the micro-patterning techniques photolithography,being the preferred method for the inorganic semiconductor industry,did not create much impact due to its incompatibility with the majority of organic electronic materials.Here we introduce a novel,chemically benign approach to dry photolithographic patterning of organic materials using super-critical carbon dioxide(scCO2)as a green developing solvent.We illustrate the possible applications of the new technique by patterning conducting polymers and light emitting polymers for organic light emitting diodes.