首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Optoelectronic properties and polar nano-domain behavior of sol-gel derived K0.5Na0.5Nb1-xMnxO3-delta nanocrystalline films with enhanced ferroelectricity
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Optoelectronic properties and polar nano-domain behavior of sol-gel derived K0.5Na0.5Nb1-xMnxO3-delta nanocrystalline films with enhanced ferroelectricity

机译:溶胶-凝胶法制备的铁电性增强的K0.5Na0.5Nb1-xMnxO3-δ纳米晶薄膜的光电性质和极性纳米域行为

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摘要

High-quality lead-free piezoelectric K0.5Na0.5Nb1-xMnxO3-delta (KNNMx, 0 <= x <= 0.10) films have been successfully deposited on Pt(111)/Ti/SiO2/Si(100) substrates by a modified sol-gel method. The effects of Mn substitution on the microstructure, morphology, lattice vibrations, and optical and ferroelectric properties of the KNNMx films have been investigated in detail. All films are polycrystalline, crack-free and show a pseudo-cubic (pc) structure with a thickness of about 215 nm. Raman analysis indicates that the characteristic frequency of nu(1), nu(5) and nu(1) + nu(5) modes shifts towards lower wavenumbers with increasing Mn concentration. The optimal ferroelectric properties were obtained in the film doped with x = 0.06, whose remnant polarization (2P(r)) and coercive field (2E(c)) values at the applied electric field of 1000 kV cm(-1) are 51 mu C cm(-2) and 265 kV cm(-1), respectively. The increased valence of Mn2+, which is substituted at the Nb5+ site as Mn3+, plays an important role in reducing the amount of both oxygen vacancies and holes. In addition, the dielectric functions of the KNNMx films have been uniquely extracted by fitting ellipsometric spectra with the Adachi dielectric function model and a four-phase layered model (air/surface rough layer/KNNMx/Pt) in the photon energy range of 1.5-5.5 eV. The optical band gap (E-g) slightly decreases, while the high-frequency dielectric constant (epsilon(infinity)) linearly increases with increasing Mn concentration. Moreover, temperature dependent optical dispersion behavior of the KNNM0.06 film has been investigated from 300 K to 800 K. The analysis of E-g and the extinction coefficient (k) reveals the correlation between optical properties and structural phase transition. Furthermore, a distinct in-plane (180 degrees) polar nano-domain pattern with a well-defined rectangular phase hysteresis loop has been observed in the KNNM0.06 film from piezoresponse force microscopy (PFM) experiments. The present results could be crucial for potential multifunctional KNN-based device applications.
机译:高质量的无铅压电K0.5Na0.5Nb1-xMnxO3-delta(KNNMx,0 <= x <= 0.10)膜已通过改性成功地沉积在Pt(111)/ Ti / SiO2 / Si(100)衬底上溶胶-凝胶法。已经详细研究了锰取代对KNNMx膜的微观结构,形态,晶格振动以及光学和铁电性能的影响。所有膜都是多晶的,无裂纹的,并显示出伪立方(pc)结构,厚度约为215 nm。拉曼分析表明,随着锰浓度的增加,nu(1),nu(5)和nu(1)+ nu(5)模的特征频率向更低的波数移动。在掺杂x = 0.06的薄膜中获得了最佳的铁电性能,该薄膜在1000 kV cm(-1)的施加电场下的残余极化(2P(r))和矫顽场(2E(c))值为51μ C cm(-2)和265 kV cm(-1)。在Nb5 +位置被Mn3 +取代的Mn2 +价的增加在减少氧空位和空穴的数量方面起着重要作用。此外,通过将椭圆偏振光谱与Adachi介电函数模型和一个四相分层模型(空气/表面粗糙层/ KNNMx / Pt)在光子能量范围为1.5-μm的范围内拟合,来唯一提取KNNMx膜的介电函数。 5.5 eV。光学带隙(E-g)略有减小,而高频介电常数(ε(无限大))随着Mn浓度的增加而线性增加。此外,已经研究了KNNM0.06薄膜在300 K至800 K范围内随温度变化的光学色散行为。对E-g和消光系数(k)的分析揭示了光学性质与结构相变之间的相关性。此外,在压电响应力显微镜(PFM)实验的KNNM0.06薄膜中已观察到具有明确的矩形相滞后回线的独特的面内(180度)极性纳米域图案。目前的结果对于潜在的基于多功能KNN的设备应用至关重要。

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