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Copper(I) Selenide Thin Films Deposited by a Solution-Based Method for Photovoltaic Applications

机译:溶液法沉积的硒化铜(I)薄膜在光伏中的应用

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摘要

Polycrystalline Cu_(2-x)Se thin films for solar cell application were deposited by a solution-based continuous flow reactor (CFR) process. In order to study the influence of reaction time on the physical, structural, and optical properties of the Cu_(2-x)Se thin films, the deposition time for impinging varied from 2 min to 15 min. Based on X-ray diffraction (XRD), scanning electron microscopy (SEM), and UV-visible spectrophotometry, the optimum time to deposit the Cu_(2-x)Se thin films using the CFR process was 10 min. The X-ray diffraction analysis revealed the cubic structure of the Cu_(2-x)Se thin films annealed at 400℃. The estimated band gap of the film was approximately 2.20 eV and its average grain size was around 150 nm with a film thickness of 1.8 μm. Energy dispersive analysis by X-ray (EDAX) showed that the atomic weight ratio of Cu to Se in the Cu_(2-x)Se film deposited for 10 min was 1.8:1, i.e., x = 0.2. The chemical binding information of the Cu_(2-x)Se thin film was also studied using X-ray photoelectron spectroscopy (XPS).
机译:通过基于溶液的连续流反应器(CFR)工艺沉积了用于太阳能电池的多晶Cu_(2-x)Se薄膜。为了研究反应时间对Cu_(2-x)Se薄膜的物理,结构和光学性质的影响,撞击的沉积时间从2分钟到15分钟不等。基于X射线衍射(XRD),扫描电子显微镜(SEM)和紫外可见分光光度法,使用CFR工艺沉积Cu_(2-x)Se薄膜的最佳时间为10分钟。 X射线衍射分析表明,在400℃退火的Cu_(2-x)Se薄膜的立方结构。估计的膜带隙约为2.20 eV,其平均晶粒尺寸约为150 nm,膜厚度为1.8μm。通过X射线(EDAX)的能量色散分析表明,沉积10分钟的Cu_(2-x)Se膜中Cu与Se的原子重量比为1.8∶1,即x = 0.2。还使用X射线光电子能谱(XPS)研究了Cu_(2-x)Se薄膜的化学结合信息。

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