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首页> 外文期刊>Journal of nanoscience and nanotechnology >Experimental and Theoretical Study of the Optical and Electrical Properties of Nanostructured Indium Tin Oxide Fabricated by Oblique-Angle Deposition
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Experimental and Theoretical Study of the Optical and Electrical Properties of Nanostructured Indium Tin Oxide Fabricated by Oblique-Angle Deposition

机译:斜角沉积纳米结构铟锡氧化物光电性能的实验和理论研究

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摘要

Oblique-angle deposition of indium tin oxide (ITO) is used to fabricate optical thin-film coatings with a porous, columnar nanostructure. Indium tin oxide is a material that is widely used in industrial applications because it is both optically transparent and electrically conductive. The ITO coatings are fabricated, using electron-beam evaporation, with a range of deposition angles between 0° (normal incidence) and 80°. As the deposition angle increases, we find that the porosity of the ITO film increases and the refractive index decreases. We measure the resistivity of the ITO film at each deposition angle, and find that as the porosity increases, the resistivity increases superlinearly. A new theoretical model is presented to describe the relationship between the ITO film's resistivity and its porosity. The model takes into account the columnar structure of the film, and agrees very well with the experimental data.
机译:铟锡氧化物(ITO)的斜角沉积用于制造具有多孔圆柱状纳米结构的光学薄膜涂层。氧化铟锡是一种在工业应用中广泛使用的材料,因为它既透光又导电。 ITO涂层是使用电子束蒸发法制成的,其沉积角度范围在0°(法向入射)和80°之间。随着沉积角度的增加,我们发现ITO膜的孔隙率增加而折射率降低。我们在每个沉积角度测量ITO膜的电阻率,发现随着孔隙率的增加,电阻率呈超线性增加。提出了一个新的理论模型来描述ITO膜的电阻率与其孔隙率之间的关系。该模型考虑了薄膜的柱状结构,与实验数据非常吻合。

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