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首页> 外文期刊>Journal of nanoparticle research: An interdisciplinary forum for nanoscale science and technology >Chemical modifications and stability of diamond nanoparticles resolved by infrared spectroscopy and Kelvin force microscopy Nanostructured Materials 2012. Special Issue Editors: Juan Manuel Rojo, Vasileios Koutsos
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Chemical modifications and stability of diamond nanoparticles resolved by infrared spectroscopy and Kelvin force microscopy Nanostructured Materials 2012. Special Issue Editors: Juan Manuel Rojo, Vasileios Koutsos

机译:金刚石纳米粒子的化学修饰和稳定性通过红外光谱和开尔文力显微镜《纳米结构材料2012》解决。特刊编辑:Juan Manuel Rojo,Vasileios Koutsos

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摘要

Chemically modified 5-nm detonation diamond nanoparticles (DNPs) are characterized by grazing angle reflectance (GAR) Fourier transform infrared spectroscopy (FTIR), Kelvin force microscopy (KFM), and X-ray photoelectron spectroscopy (XPS). Using GAR-FTIR we discuss the surface chemistry and stability of the as-received DNPs, and compare them with DNPs modified by annealing in air or by oxygen plasma treatment. Infrared spectra of the as-received DNPs are dominated by C-H bonds and carboxylic groups (COOH), probably related to the wet chemical treatment in acids. Annealing in air and oxygen plasma lead to a significant enhancement of C=O groups and vanishing C-H groups. After short-term (10 min) oxygen plasma treatment, infrared peaks change in intensity and position indicating a spontaneous reactivity of DNPs, probably due to the partial erosion of the graphitic shell. Prolonged oxygen plasma treatment (40 min) or annealing in air at 450 C for 30 min provides a stable DNPs surface. Surface potentials of DNPs obtained by KFM are well correlated with the GAR-FTIR measurements. XPS characterization corroborates DNPs compositional changes after the modification procedures.
机译:化学修饰的5 nm爆轰金刚石纳米颗粒(DNP)的特征在于掠角反射率(GAR)傅里叶变换红外光谱(FTIR),开尔文力显微镜(KFM)和X射线光电子能谱(XPS)。使用GAR-FTIR,我们讨论了收到的DNP的表面化学性质和稳定性,并将它们与通过在空气中退火或通过氧等离子体处理改性的DNP进行比较。接收到的DNP的红外光谱主要由C-H键和羧基(COOH)决定,这可能与酸中的湿化学处理有关。空气和氧气等离子体中的退火导致C = O基团的显着增强和C-H基团的消失。短期(10分钟)氧等离子体处理后,红外峰的强度和位置发生变化,表明DNP的自发反应性,可能是由于石墨壳的部分腐蚀所致。长时间的氧等离子体处理(40分钟)或在空气中于450°C退火30分钟可提供稳定的DNP表面。通过KFM获得的DNP的表面电势与GAR-FTIR测量具有很好的相关性。 XPS表征证实了修饰程序后DNP的成分变化。

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