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首页> 外文期刊>Journal of Materials Science Letters >Silicon dioxide buffer at anode/polymer interface for enhanced brightness and efficiency of polymer light-emitting diode
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Silicon dioxide buffer at anode/polymer interface for enhanced brightness and efficiency of polymer light-emitting diode

机译:阳极/聚合物界面处的二氧化硅缓冲液可提高聚合物发光二极管的亮度和效率

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摘要

There has been recently renewed interest in improving the poor efficiency of light-emitting diodes (LED) such as organic light-emitting diodes (OLED) and polymer light-emitting diodes (PLED) [1-3]. The limited performance of existing diodes results from the fact that a device formed on a bare indium-tin-oxide (ITO) surface usually shows insufficient hole injection and poor operational stability. One previously reported improvement for this situation has involved interposing an intermediate layer between the ITO and the active layer [4-7]. The insertion of the layer generally results in a substantial increase in drive voltage because of a hole injection barrier present at the interface. However, the improvement in operational stability is insufficient, and the effectiveness of the treatment is strongly dependent on processing conditions. In order to improve the efficiency, the method of room-temperature liquid phase deposition (LPD) to deposit an ultra-thin silicon dioxide film on the ITO is employed [8-11].
机译:最近,人们对改善诸如有机发光二极管(OLED)和聚合物发光二极管(PLED)之类的发光二极管(LED)的效率低下产生了新的兴趣[1-3]。现有二极管的有限性能归因于以下事实:在裸露的氧化铟锡(ITO)表面上形成的器件通常显示出不足的空穴注入和较差的操作稳定性。先前报道的针对这种情况的改进涉及在ITO和有源层之间插入中间层[4-7]。由于在界面处存在空穴注入势垒,因此该层的插入通常导致驱动电压显着增加。然而,操作稳定性的改善是不够的,并且处理的有效性在很大程度上取决于加工条件。为了提高效率,采用了室温液相沉积(LPD)在ITO上沉积超薄二氧化硅膜的方法[8-11]。

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