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Antimony doping of tin oxide coatings prepared by the oxidative-soak-coating method

机译:通过氧化浸涂法制备的氧化锡涂层的锑掺杂

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摘要

Coatings based on SnO_2 are industrially important materials that are used for electrodes of solar cells, liquid crystal displays, gas sensors, or protective coatings on glassware. Numerous methods for the deposition of electrically conductive SnO_2 coatings have been reported, such as sputtering, MOCVD, spray pyrolysis, or sol-gel methods. Recently, a number of methods for direct deposition of SnO_2-based coatings from aqueous solutions have been reported [1-6]. These methods are advantageous over conventional film deposition techniques because they may enable us to deposit coatings on substrates with large surface area or low thermal durability. Another advantage of the direct deposition methods is that they are capable of forming coatings on substrates with complicated morphology, such as fine powders, fine fibers, or inner walls of porous bodies. For example, fine inorganic powders coated with electrically conductive materials are important as fillers of polymers to fabricate non-electrostatic-charging polymers. The direct deposition techniques should make it easy to fabricate them.
机译:基于SnO_2的涂层是工业上重要的材料,可用于太阳能电池的电极,液晶显示器,气体传感器或玻璃器皿上的保护性涂层。已经报道了许多用于沉积导电SnO_2涂层的方法,例如溅射,MOCVD,喷雾热解或溶胶-凝胶法。最近,已经报道了许多从水溶液中直接沉积SnO_2基涂层的方法[1-6]。这些方法优于常规的膜沉积技术,因为它们可以使我们将涂层沉积在具有大表面积或低热耐久性的基材上。直接沉积方法的另一个优点是它们能够在具有复杂形态的基底(例如细粉,细纤维或多孔体的内壁)上形成涂层。例如,涂覆有导电材料的无机细粉作为聚合物的填料以制造非静电充电的聚合物是重要的。直接沉积技术应使其易于制造。

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