Examination and computational fluid dynamics study on the gas flow in two different reaction vessels of pressure pulse chemical vapour infiltration

摘要

The chemical vapour infiltration (CVI) process has been receiving attention as a process for the fabrication of ceramic or carbon matrix composites [1-3]. Among CVI techniques, pressure pulse CVI (pulse-CVI), in which sequential steps of evacuation of gas in the reaction vessel, instantaneous introduction of source gas and holding to reaction are repeated, have many advantages, including the short operation time and the uniform infiltration irrespective of the depth from the substrate surface [4-6].