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首页> 外文期刊>Journal of Low Temperature Physics >Pulsed Nuclear Magnetic Resonance on ~(3)He Adsorbed on Bare and ~(4)He Preplated MCM-41 Using DC SQUID Detection
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Pulsed Nuclear Magnetic Resonance on ~(3)He Adsorbed on Bare and ~(4)He Preplated MCM-41 Using DC SQUID Detection

机译:使用DC SQUID检测在裸露的〜(3)He和〜(4)He预先电镀的MCM-41上的脉冲核磁共振

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We report low field DC SQUID NMR measurements down to 1.5 K of ~(3)He adsorbed in the pores of the mesoporous molecular sieve MCM-41. In the first experiment measurements were made on ~(3)He adsorbed onto the bare pore walls of MCM-41 with coverages ranging from n_(3_(He)) velence 0.86n_(1) to full pores at n_(3_(He)) velence 1.79n_(1), where n_(1) is the coverage for monolayer completion. A second experiment was performed with low ~(3)He coverages (n_(3_(He)) approx 0.01n_(1)) on ~(4)He preplated pores, where a crossover to a quasi-1D state is expected to occur at temperatures sufficiently below 700 mK. In both experiments relaxation times T_(1) and T_(2)~(*) were measured as a function of temperature and coverage at frequencies from 80 to 240 kHz. The frequency dependence of the linewidth in the pure ~(3)He experiment is extremely weak therefore T_(2)~(*) approx= T_(2). The 1.5 K isotherm shows a small minimum in T_(2)~(*) at a coverage corresponding to monolayer completion. In the experiment with ~(4)He preplating there was no significant change in T_(1) or T_(2)~(*) when the ~(3)He coverage was doubled from n_(3_(He)) velence 0.01n_(1) to 0.02n_(1) at a ~(4)He preplating of n_(4_(He)) velence 1.05n_(1). This suggests that the relaxation times are dominated by single particle effects in the low density regime.
机译:我们报告低场DC SQUID NMR测量低至〜(3)He吸附在中孔分子筛MCM-41的孔中的1.5K。在第一个实验中,对〜(3)He吸附到MCM-41的裸孔壁上进行了测量,覆盖范围从n_(3_(He))velence 0.86n_(1)到n_(3_(He)处的全孔velence 1.79n_(1),其中n_(1)是单层完成的覆盖率。在〜(4)He预镀孔上以低〜(3)He覆盖率(n_(3_(He))约0.01n_(1))进行第二个实验,预计会发生过渡到准1D状态在足够低于700 mK的温度下。在两个实验中,弛豫时间T_(1)和T_(2)〜(*)都是温度和覆盖率的函数,在80至240 kHz的频率下测量。纯〜(3)He实验中线宽的频率依赖性非常弱,因此T_(2)〜(*)近似= T_(2)。 1.5 K等温线显示在T_(2)〜(*)中的最小值很小,覆盖范围对应于单层完成。在〜(4)He预镀的实验中,当〜(3)He覆盖范围从n_(3_(He))速度0.01n_翻倍时,T_(1)或T_(2)〜(*)的变化无明显变化从(1)到0.02n_(1)在n_(4_(He))速度1.05n_(1)的〜(4)He预镀层。这表明在低密度状态下,弛豫时间主要受单粒子效应的影响。

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