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首页> 外文期刊>Journal of Materials Science >DENSE OUTER LAYERS FORMED BY PLASMA TREATMENTS OF SILICA COATINGS PRODUCED BY THE SOL-GEL METHOD
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DENSE OUTER LAYERS FORMED BY PLASMA TREATMENTS OF SILICA COATINGS PRODUCED BY THE SOL-GEL METHOD

机译:溶胶-凝胶法等离子处理二氧化硅涂层形成的致密外层

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摘要

Silica gel coatings prepared by the sol-gel method were subjected to low-temperature plasma treatments in air and argon. This was found to give rise to the formation of a dense outer layer, whose thickness increased with the duration of the treatment and decreased when the pressure in the plasma chamber was reduced. The formation of a dense layer in the coatings was confirmed from measurements of the overall thickness and the refractive index by ellipsometry, and also from TEM examination and light transmission experiments. The coatings were found to contain an uppermost layer of alumina, which was formed through secondary sputtering of aluminium from the electrodes in the plasma chamber. The concentration of alumina in the mixture with silica decreased through the thickness of the coating and became zero at a distance slightly smaller than the overall thickness of the dense layer. The thickness of the dense layer was found to be slightly higher with argon than with air plasma treatments. Whereas the aluminium concentration through the thickness of the coating was the same for the two types of treatment, a carbon residue was found only in the case of argon plasma treatments. The com position of the underlying silica layers was found to correspond to SiO1.6. [References: 15]
机译:将通过溶胶-凝胶法制备的硅胶涂层在空气和氩气中进行低温等离子体处理。发现这导致形成致密的外层,该外层的厚度随着处理的持续时间而增加,并且当等离子体室中的压力降低时减小。通过椭圆偏振法对总厚度和折射率的测量,以及通过TEM检查和透光实验,可以确认涂层中形成了致密层。发现涂层包含氧化铝的最上层,其通过从等离子体室中的电极二次铝的二次溅射形成。与二氧化硅的混合物中氧化铝的浓度在整个涂层厚度上降低,并且在比致密层的总厚度稍小的距离处变为零。发现在氩气下致密层的厚度比在空气等离子体处理下略高。尽管对于两种处理,贯穿涂层厚度的铝浓度是相同的,但是仅在氩等离子体处理的情况下才发现碳残留物。发现下面的二氧化硅层的组成对应于SiO1.6。 [参考:15]

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