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首页> 外文期刊>Journal of Materials Science >The effect of long range order on the activation energy for atomic migration in NiAl alloys; resistivity study
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The effect of long range order on the activation energy for atomic migration in NiAl alloys; resistivity study

机译:远距离有序对NiAl合金中原子迁移的活化能的影响;电阻率研究

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The influence of the degree of long range order (S) on the migration energy in NiAl was investigated by electrical resistivity and X-ray diffraction. Iron (12at.%) was over-alloyed to the stoichiometric NiAl in order to decrease the order-disorder transition temperature.(NiAl12Fe) The degree of LRO in NiAl12Fe decreased gradually as temperature increased. The activation energies for migration of iron in NiAl12Fe (Q(A)(Fe*)) that were measured from the temperature dependence of jumping frequency (1/tau(Fe*)) were 1.42 +/- 0.19 eV, 1.35 +/- 0.18 eV, 1.16 +/- 0.06 eV for the alloys quenched from 1073 K, 1273 K, and 1473 K respectively. The activation energies for migration of excess vacancy (Q(A)(v*)) in NiAl single crystal, were 1.55 +/- 0.02 eV for the specimen quenched from 1473 K and 1.40 +/- 0.11 eV for one quenched from 1673 K. The degree of LRO (S) in single crystalline NiAl calculated from the result of Hughes Lautensclager, Cohen and Brittain, J. Appl. Phys. 42 (1971) 3705 seems to be consistent with this decreasing tendency in the activation energy. The reduction of the degree of LRO (S) can explain these variations in the migration energy as the Girifalco's model. (C) 2002 Kluwer Academic Publishers. [References: 18]
机译:通过电阻率和X射线衍射研究了远程有序度(S)程度对NiAl中迁移能的影响。为了降低有序无序转变温度,将铁(12at。%)过度合金化至化学计量的NiAl。NiAl12Fe中的LRO程度随着温度的升高而逐渐降低。根据跳跃频率(1 / tau(Fe *))的温度依赖性测得的NiAl12Fe(Q(A)(Fe *))中铁迁移的活化能为1.42 +/- 0.19 eV,1.35 +/-分别从1073 K,1273 K和1473 K淬火的合金为0.18 eV,1.16 +/- 0.06 eV。 NiAl单晶中过量空位(Q(A)(v *))迁移的活化能,从1473 K淬灭的样品为1.55 +/- 0.02 eV,从1673 K淬灭的样品为1.40 +/- 0.11 eV根据Hughes Lautensclager,Cohen and Brittain,J.Appl.Chem。,1987,48,3105-597的结果计算出的单晶NiAl中的LRO(S)的程度。物理42(1971)3705似乎与活化能的这种下降趋势一致。 LRO(S)程度的降低可以解释迁移能的这些变化,这就是Girifalco模型。 (C)2002 Kluwer学术出版社。 [参考:18]

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