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首页> 外文期刊>Journal of Materials Science >Development of surface finish during the polishing of porcelain ceramic tiles
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Development of surface finish during the polishing of porcelain ceramic tiles

机译:陶瓷瓷砖抛光过程中表面光洁度的发展

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Polishing tests on a laboratory scale have been used to simulate and study the industrial polishing process for unglazed porcelain ceramic tiles. Tile surface quality was assessed in terms of roughness and optical gloss. Tests with a sequence of progressively smaller silicon carbide abrasive particles showed a general trend of decreasing roughness and increasing gloss during the process. The coarser abrasives (larger than 400 grit number) caused the major change in surface roughness, while the finer abrasives (smaller than 400 grit number) produced the major change in gloss. In these materials the maximum gloss achievable by polishing is limited by the porosity of the ceramic. The rate of material removal during polishing with a coarse abrasive obeyed an Archard-type wear law, being linearly proportional to applied load, although load had little effect on the surface roughness attained after different durations of polishing. In contrast, load had a significant effect on gloss, with higher loads leading to higher values of gloss. The development of both roughness and gloss with polishing time is well described by quantitative empirical models involving a simple exponential function. The same model for gloss evolution is also shown to apply to data reported from industrial-scale polishing experiments in previous work. (C) 2005 Springer Science + Business Media, Inc.
机译:实验室规模的抛光测试已用于模拟和研究无釉陶瓷瓷砖的工业抛光工艺。根据粗糙度和光学光泽度评估瓷砖表面质量。用一系列逐渐变小的碳化硅磨料颗粒进行的测试表明,在加工过程中总体趋势是粗糙度降低,光泽度增加。较粗糙的磨料(大于400粒度)引起表面粗糙度的主要变化,而较细的磨料(小于400粒度)引起光泽的主要变化。在这些材料中,通过抛光可获得的最大光泽度受到陶瓷孔隙率的限制。尽管在不同的抛光时间后负载对获得的表面粗糙度影响不大,但使用粗磨料进行抛光时材料的去除率遵循Archard型磨损定律,与施加的负载成线性比例。相反,负载对光泽度有显着影响,较高的负载会导致较高的光泽度值。通过涉及简单指数函数的定量经验模型可以很好地描述粗糙度和光泽度随抛光时间的发展。还证明了用于光泽产生的相同模型也适用于先前工作中工业规模抛光实验报告的数据。 (C)2005年Springer Science + Business Media,Inc.

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