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Understanding AlN sintering through computational thermodynamics combined with experimental investigation

机译:通过计算热力学和实验研究来了解AlN烧结

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Aluminum nitride (A1N) has attracted large interest recently as a suitable material for hybrid integrated circuit substrates because of its high thermal conductivity, high flexural strength, good dielectric properties, thermal expansion coefficient matches that of Si and non-toxic nature. Yttria (Y_2O_3) is the best additive for A1N sintering. Binary diagrams of Al_2O_3-Y_2O_3, A1N-Al_2O_3, and A1N-Y_2O_3 were thermodynamically modelled. The obtained Gibbs free energies of components, stoichiometric phases and solution parameters were used to build a thermodynamic database of AlN-Al_2O_3-Y_2O_3 system. Liquid-phase sintering of A1N with Y_2O_3 as an additive has been studied and compared with the thermodynamic results. Sintering was performed in the temperature range of 1750-1950 deg C for upto 4h under a N_2 atmosphere to optimise the sintering conditions for each composition. The relative density exceeded 95 percent for all the compositions sintered at 1850 deg C and full densification was achieved for all four compositions sintered at 1900 deg C. The microstructure and assemblage of the secondary phase have a significant effect on the final thermal conductivity of the sintered A1N. Thermodynamic modelling of AIN-Al_2O_3-Y_2O_3 system provided an important basis for understanding the sintering behaviour and interpreting the experimental results.
机译:氮化铝(AlN)由于其高的导热率,高的弯曲强度,良好的介电性能,与硅相匹配的热膨胀系数和无毒的性质,最近作为混合集成电路衬底的合适材料引起了广泛的兴趣。氧化钇(Y_2O_3)是AlN烧结的最佳添加剂。对Al_2O_3-Y_2O_3,AlN-Al_2O_3和AlN-Y_2O_3的二元图进行了热力学建模。利用所获得的各组分的吉布斯自由能,化学计量相和溶液参数建立了AlN-Al_2O_3-Y_2O_3体系的热力学数据库。研究了Y_2O_3作为添加剂对AlN进行液相烧结的方法,并与热力学结果进行了比较。在N_2气氛下,在1750-1950摄氏度的温度范围内进行烧结长达4h,以优化每种组合物的烧结条件。对于在1850℃烧结的所有组合物,相对密度均超过95%,并且对于在1900℃烧结的所有四种组合物均实现了完全致密化。次生相的微观结构和组装对烧结的最终热导率有显着影响A1N。 AIN-Al_2O_3-Y_2O_3体系的热力学建模为理解烧结行为和解释实验结果提供了重要依据。

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