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Interfacial Interaction and Diffusion in Binary Systems

机译:二元体系中的界面相互作用与扩散

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摘要

A physico-chemical consideration of the interfacial interaction and diffusion resulting in the formation of chemical compound layers at the interface of initial substances A and B is presented. The layer-growth kinetics is shown to be much more complicated than it follows from conventional diffusional views neglecting interfacial reactions. In the majority of multiphase binary systems, layer occurrence appears to be sequential rather than simultaneous. Under conditions of diffusion control, the number of simultaneously growing compound layers at the A-B interface cannot exceed two. Multiple layers (three and more) can only form as a result of secondary processes connected with the rupture of a diffusion couple. In such cases, great care is necessary when calculating diffusion coefficients to avoid obtaining their physically meaningless values.
机译:提出了界面相互作用和扩散的物理化学考虑,该相互作用和扩散导致在初始物质A和B的界面处形成化合物层。从传统的忽略界面反应的扩散观点来看,层增长动力学比其复杂得多。在大多数多相二元系统中,层的出现似乎是顺序的,而不是同时的。在扩散控制的条件下,在A-B界面上同时生长的化合物层的数量不能超过两个。多层(三层或更多层)只能由与扩散偶破裂有关的次级过程形成。在这种情况下,在计算扩散系数时必须格外小心,以免获得其物理上无意义的值。

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