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首页> 外文期刊>Journal of Electronic Materials >Electrodeposition of Bi_(x)Sb_(2-x)Te_(y) Thermoelectric Films from DMSO Solution
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Electrodeposition of Bi_(x)Sb_(2-x)Te_(y) Thermoelectric Films from DMSO Solution

机译:DMSO溶液电沉积Bi_(x)Sb_(2-x)Te_(y)热电薄膜

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摘要

The electrochemical behavior of nonaqueous dimethyl sulfoxide solutions of Bi~(III), Te~(IV), and Sb~(III) was investigated using cyclic voltammetry. On this basis, Bi_(x)Sb_(2-x)Te_(y) thermoelectric films were prepared by the potentiodynamic electrodeposition technique in nonaqueous dimethyl sulfoxide solution, and the composition, structure, morphology, and thermoelectric properties of the films were analyzed. Bi_(x)Sb_(2-x)Te_(y) thermoelectric films prepared under different potential ranges all possessed a smooth morphology. After annealing treatment at 200 deg C under N_(2) protection for 4 h, all deposited films showed p-type semiconductor properties, and their resistances all decreased to 0.04 OMEGA to 0.05 OMEGA. The Bi_(0.49)Sb_(1.53)Te_(2.98) thermoelectric film, which most closely approaches the stoichiometry of Bi_(0.5)Sb_(1.5)Te_(3), possessed the highest Seebeck coefficient (85 (mu)V/K) and can be obtained under potentials of -200 mV to -400 mV.
机译:用循环伏安法研究了Bi〜(III),Te〜(IV)和Sb〜(III)的非水二甲基亚砜溶液的电化学行为。在此基础上,通过电位动态电沉积技术在非二甲基亚砜水溶液中制备了Bi_(x)Sb_(2-x)Te_(y)热电薄膜,并对薄膜的组成,结构,形貌和热电性能进行了分析。在不同电势范围下制备的Bi_(x)Sb_(2-x)Te_(y)热电薄膜均具有光滑的形貌。在N_(2)保护下于200℃退火处理4 h后,所有沉积膜均显示出p型半导体性能,其电阻均降低至0.04 OMEGA至0.05 OMEGA。最接近Bi_(0.5)Sb_(1.5)Te_(3)的化学计量比的Bi_(0.49)Sb_(1.53)Te_(2.98)热电薄膜具有最高的塞贝克系数(85μV/ K)可以在-200 mV至-400 mV的电势下获得。

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