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首页> 外文期刊>Journal of Electronic Materials >Phase Identification and Growth Kinetics of the Intermetallic Compounds Formed during In-49Sn/Cu Soldering Reactions
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Phase Identification and Growth Kinetics of the Intermetallic Compounds Formed during In-49Sn/Cu Soldering Reactions

机译:In-49Sn / Cu钎焊反应过程中形成的金属间化合物的相鉴定和生长动力学

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For the application of In-49Sn solder in bonding recycled-sputtering targets to Cu back plates, the intermetallic compounds formed at the In-49Sn/Cu interface are investigated. Scanning electron microscopy (SEM) observations show that the interfacial intermetallics consist of a planar layer preceded by an elongated scalloped structures. Electron-probe microanalyzer analyses indicate that the chemical compositions of the planar layer and the scalloped structure are Cu_(74.8)In_(12.2)Sn_(13.0) and Cu_(56.2)In_(20.1)Sn_(23.7), respectively, which correspond to the #epsilon#-Cu_3(In,Sn) and #eta#-Cu_6(In,Sn)_5 phases. Kinetics analyses show that the growth of both intermetallic compounds is diffuson controlled. The activation energies for the growth of #eta#- and #epsilon#-intermetallics are calculated to be 28.9 kJ/mol and 186.1 kJ/mol. Furthermore, the formation mechanism of intermetallic compounds during the In-49Sn/Cu soldering reaction is clarified by marking the original interface with a Ta-thin film. Wetting tests are also performed, which reveal that the contact angles of liquid In-49Sn drops on Cu substrates decline to an equilibrium value of 25 deg C.
机译:为了将In-49Sn焊料用于将循环溅射靶材粘结到Cu背板上,研究了在In-49Sn / Cu界面形成的金属间化合物。扫描电子显微镜(SEM)观察表明,界面金属间化合物由平面层组成,之后是细长的扇贝状结构。电子探针显微分析仪分析表明,平面层和扇形结构的化学成分分别为Cu_(74.8)In_(12.2)Sn_(13.0)和Cu_(56.2)In_(20.1)Sn_(23.7),分别对应于#epsilon#-Cu_3(In,Sn)和#eta#-Cu_6(In,Sn)_5相。动力学分析表明,两种金属间化合物的生长均受扩散控制。计算出#eta#-和#epsilon#金属间化合物的生长活化能分别为28.9 kJ / mol和186.1 kJ / mol。此外,通过在Ta-Thin薄膜上标记原始界面,可以明确In-49Sn / Cu焊接反应过程中金属间化合物的形成机理。还进行了润湿测试,结果表明,液态In-49Sn液滴在Cu衬底上的接触角下降到25摄氏度的平衡值。

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