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Addition of SiC Particles to Ag Die-Attach Paste to Improve High-Temperature Stability; Grain Growth Kinetics of Sintered Porous Ag

机译:在Ag压铸胶中添加SiC颗粒以提高高温稳定性;烧结多孔Ag的晶粒长大动力学

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摘要

To improve the high-temperature reliability of sintered Ag joints, three types of silicon carbide particle (SiCp) of different size and morphology were added to Ag micron-flake paste. Quality sintered joints between Cu dummy chips and Cu substrate were obtained at a relatively low temperature (250A degrees C), in air, under low load (0.4 MPa), and 35 MPa die-shear strength was achieved. High-temperature stability was investigated by means of aging tests at 150, 200, and 250A degrees C for 500 h, and by thermal cycling between -50A degrees C and 250A degrees C for up to 170 cycles. The best distribution and compatibility with porous sintered Ag structures was observed for sub-micron SiC particles with an average diameter of 600 nm. After high-temperature storage for 500 h at 250A degrees C, mean Ag grain size of the SiC-containing joints was unchanged whereas that for pure sintered Ag increased from 1.1 to 2.5 mu m. Ag joints containing the optimum amount (2 wt.%) of SiCp retained their original strength (20 MPa) after storage at 250A degrees C for 500 h. The shear strength of Ag joints without added SiCp decreased from 27 to 7 MPa after 500 h because of grain growth, which obeyed the classical parabolic law. Grain growth in pure Ag joints is discussed in terms of a temperature-dependent exponent n and activation energy Q. Our SiCp-containing joints resisted the grain growth that induces interfacial cracks during thermal cycling.
机译:为了提高烧结银接头的高温可靠性,将不同尺寸和形态的三种类型的碳化硅颗粒(SiCp)添加到银微米片状浆料中。在较低的温度(250A摄氏度),空气中,低负荷(0.4 MPa)下,获得了铜虚设芯片和Cu基板之间的优质烧结接头,并获得了35 MPa的模切强度。通过在150、200和250A摄氏度下进行500小时的老化测试,以及在-50A到250A摄氏度之间的热循环长达170个循环,研究了高温稳定性。对于平均直径为600 nm的亚微米SiC颗粒,观察到了最佳的分布和与多孔烧结Ag结构的相容性。在250A的温度下高温存储500小时后,含SiC的接头的平均Ag晶粒尺寸保持不变,而纯烧结Ag的晶粒尺寸从1.1微米增加到2.5微米。在250A的温度下储存500小时后,含有最适量(2 wt。%)SiCp的银接头保留了其原始强度(20 MPa)。不添加SiCp的Ag接头的剪切强度在500 h后由于晶粒生长而从27 MPa降低到7 MPa,这符合经典的抛物线定律。根据温度指数n和活化能Q讨论了纯银接头中的晶粒长大。我们的含SiCp的接头可抵抗晶粒长大,而晶粒长大会在热循环过程中引起界面裂纹。

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