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首页> 外文期刊>Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry >Numerical simulations of linear scan anodic stripping voltammetry at a modified square array of hemispherical microelectrodes located in a thin-layer cell
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Numerical simulations of linear scan anodic stripping voltammetry at a modified square array of hemispherical microelectrodes located in a thin-layer cell

机译:线性扫描阳极溶出伏安法在位于薄层电池中的半球形微电极的改进方形阵列上的数值模拟

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The finite element method has been used to simulate LSASV measurement at a loosely packed square array of recessed microdiscs and of hemispherical mercury microelectrodes located in a thin-layer cell. The mercury volume (radius = 7.5 μm), the protective gel (thickness = 300 μm) and the solution medium (thickness = 200 μm) have been meshed. The concentrations of the reduced and oxidised species were linked both by the Nernst equation and the equality of the fluxes at the mercury|gel interface. Both overlapping of adjacent diffusion layers and depletion occurring in this finite box decrease the amount of species being reduced during the deposition step. However, the peak width (W~(1/2) = 39 mV) and peak potential (E_p - E'~0 = -34.6 ± 1 mV) of the resulting stripping current are independent of the deposition time. During the stripping step, the metal concentration at the surface of the electrode is much higher than the initial concentration. The time to reach a uniform concentration in the gel again after the voltammetric reoxidation step has been determined, for both single microelectrode and a square array, as a function of the deposition time, thus giving the maximum frequency of successive measurements that should be used. Agreement between simulated and experimental results confirms that diffusion is the predominant transport process occurring in such thin-layer cell. In addition, comparison with analytical expressions has been done whenever possible.
机译:有限元方法已被用于模拟位于薄层电池中的凹陷微盘和半球形汞微电极的松散正方形阵列的LSASV测量。将汞体积(半径= 7.5μm),保护性凝胶(厚度= 300μm)和溶液介质(厚度= 200μm)啮合。还原和氧化物种的浓度通过能斯特方程和汞界面处通量的均等性联系在一起。相邻扩散层的重叠和在该有限盒中发生的耗尽都减少了在沉积步骤中被还原的物质的数量。然而,所得剥离电流的峰宽(W〜(1/2)= 39mV)和峰电位(E_p-E′〜0 = -34.6±1mV)与沉积时间无关。在汽提步骤中,电极表面的金属浓度远高于初始浓度。对于单个微电极和正方形阵列,已经确定了在伏安法再氧化步骤之后再次达到凝胶中均匀浓度的时间,作为沉积时间的函数,因此给出了应该使用的连续测量的最大频率。模拟结果和实验结果之间的一致性证实了扩散是这种薄层细胞中发生的主要转运过程。此外,已尽可能与分析表达式进行比较。

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