首页> 外文期刊>Journal of computational and theoretical nanoscience >Toward Mechanosynthesis of Diamondoid Structures:Simple Strategy of Building Atomically Perfect SPM Tip Through Attachment of C_(60) Molecule to Commercial Silicon Tip by Controlled Hydrogen Atom Desorption from Tip Asperity Si(111) Silicon Surface
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Toward Mechanosynthesis of Diamondoid Structures:Simple Strategy of Building Atomically Perfect SPM Tip Through Attachment of C_(60) Molecule to Commercial Silicon Tip by Controlled Hydrogen Atom Desorption from Tip Asperity Si(111) Silicon Surface

机译:朝着类金刚石结构的力学合成:通过控制C_(60)分子到尖端硅(111)硅表面的氢原子脱附而将C_(60)分子附着到商业化硅尖端上来构建原子完美的SPM尖端的简单策略

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摘要

Tip manufacturers offer micro-fabricated silicon tips in three geometries, i.e., pyramidal, tetrahedral and conical. Conical tips can be made sharp, with high aspect ratios and radii as small as 50 A. Pyramidal tips have lower aspect ratios and nominal tip radii of a few hundred angstroms, but they are more durable. However, even commercial conical tip manufacturers supply the tip structure only at the micrometer scale, and there is no direct method for imaging the very end of the tip, i.e., the "nano-tip." In this paper a very simple strategy of building atomically defined asperity on Si(111) surface of the commercial silicon tip is described. The strategy consists of four simple steps. In the first step, the silicon tip is irradiated with ultraviolet light in the atmosphere of oxygen to remove carbon contaminants. During the second step, a thermally oxidized SiO_2 layer is eliminated by HF etching to sharpen the tip apex and hydrogenation of its surface. In the third step, controlled electron-stimulated desorption of hydrogen from the tip asperity surface is applied. Finally, in the step four, the C_(60) molecule docking to surface dangling bonds is performed. In the final part of this work PM6 modeling was used to show positional mechano-synthetic capabilities of the described SPM tip.
机译:烙铁头制造商提供三种几何形状的微型硅烙铁头,即锥体,四面体和圆锥形。圆锥形尖端可以制成尖锐的,具有高的长径比和小至50 A的半径。金字塔形尖端的长径比和标称尖端半径较低,只有几百埃,但它们更耐用。但是,即使是商业的锥形尖端制造商也仅以微米级提供尖端结构,并且没有直接的方法来对尖端的末端即“纳米尖端”进行成像。在本文中,描述了一种非常简单的策略,可在商用硅尖端的Si(111)表面上建立原子定义的凹凸。该策略包括四个简单步骤。第一步,在氧气氛围中用紫外线照射硅尖端,以去除碳污染物。在第二步中,通过HF蚀刻去除热氧化的SiO_2层,以使尖端变尖并使其表面氢化。在第三步中,应用受控的电子刺激从尖端粗糙表面上解吸氢。最后,在步骤四中,执行对接至表面悬挂键的C_(60)分子。在这项工作的最后一部分中,PM6建模用于显示所述SPM尖端的位置机械合成功能。

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