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XPS Analysis of Silane Films on the Surface of a Dental Ceramic

机译:牙科陶瓷表面硅烷膜的XPS分析

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摘要

This study was designed to investigate the surface properties and the thickness of organofunctional silane films formed on leucite-reinforced feldspathic (LRF) ceramic surfaces after different methods of silane application using X-ray photoelectron spectroscopy (XPS). Six LRF ceramic discs (Mirage?,Myron Intl.,Kansas City,KS,USA) were produced according to the manufacturer's instructions and polished to a 1 μm finish. A silane coupling agent was applied to five ceramic discs using different application methods: (A) immersion in silane solution for 60 s and dried with compressed air spray for 15 s; (B) as method A but heat treated with hot air at 50 ± 5°C for 15 s; (C) silane was applied with a brush for 60 s and dried with compressed air spray for 15 s; (D) as method C but heat treated with hot air at 50 ± 5°C for 15 s; (E) as method C followed by rinsing the specimens with hot water (15 s) and drying with hot air for 30 s. The ceramic surfaces were then analyzed by XPS at 15°-60° take-off angles. The results showed the highest and the lowest increase of C_(1s) (C in the structure of silane) for treatments A and E,respectively. Signals of COO or C-COO in the high resolution spectra of C_(1s) were observed for all silane-treated ceramic surfaces. The proportion of C-Si groups on the silane-treated surfaces compared with the untreated surface was significantly increased. XPS analysis indicates that the thickness of the silane film on a leucite-reinforced feldspathic ceramic surface is a function of the mode of application. The lowest film thickness of silane was found for treatment E,which more closely matches that of a monolayer.
机译:这项研究旨在研究在使用X射线光电子能谱(XPS)施加不同的硅烷方法后,在白云石增强的长石(LRF)陶瓷表面上形成的有机官能硅烷膜的表面性质和厚度。根据制造商的说明生产了六个LRF陶瓷盘(Mirage ?,迈伦国际公司,堪萨斯城,美国堪萨斯州),并抛光至1μm的光洁度。使用不同的施加方法将硅烷偶联剂施加到五个陶瓷圆盘上:(A)在硅烷溶液中浸泡60 s,然后用压缩空气喷雾干燥15 s; (B)如方法A,但在50±5°C的热空气中热处理15 s; (C)用刷子涂硅烷60秒,并用压缩空气喷雾干燥15秒; (D)与方法C相同,但在50±5°C的热空气中热处理15 s; (E)作为方法C,然后用热水冲洗样品(15 s),并用热空气干燥30 s。然后通过XPS以15°-60°的起飞角分析陶瓷表面。结果表明,处理A和处理E的C_(1s)(硅烷结构中的C)的增幅分别最高和最低。对于所有硅烷处理的陶瓷表面,在C_(1s)的高分辨率光谱中观察到了COO或C-COO信号。与未处理的表面相比,硅烷处理的表面上的C-Si基团的比例显着增加。 XPS分析表明,在白云石增强的长石陶瓷表面上的硅烷膜厚度是涂覆方式的函数。发现处理E的硅烷的最低膜厚度,与单层膜的厚度更接近。

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