首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Study of the grain size, particle size and roughness of substrate in relation to the magnetic properties of electroplated permalloy
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Study of the grain size, particle size and roughness of substrate in relation to the magnetic properties of electroplated permalloy

机译:研究与电镀坡莫合金磁性能有关的基体的晶粒尺寸,粒径和粗糙度

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摘要

In this work, the substrate grain size effect on the deposition of Ni_(79)Fe_(21) film by electroplating has been studied. The morphology, surface roughness, particle size and magnetic properties of the deposited films are investigated in detail. The investigation shows that the grain size of the deposited films scales with the increase of the substrate grain size. It has shown that the surface roughness of the substrate is of importance. The smoother the substrate surface, the smaller the surface roughness and material coercivity of the deposited Ni_(79)Fe_(21) film. This study indicates that the smoothness and uniformity of the substrate surface are important parameters to be taken into account during electroplating. Under such consideration, Ni_(81)Fe_(19)Cu composite wire has been deposited by sputtering a layer of Cu on the Cu substrate surface to improve Cu wire surface smoothness and uniformity. It is found that with the sputtered Cu layer, the GMI effect of the deposited Ni_(81)Fe_(19)/Cu composite wire has been significantly increased.
机译:在这项工作中,研究了衬底粒径对通过电镀沉积Ni_(79)Fe_(21)膜的影响。详细研究了沉积膜的形貌,表面粗糙度,粒径和磁性。研究表明,沉积膜的晶粒尺寸随基底晶粒尺寸的增加而缩放。已经表明,基材的表面粗糙度是重要的。基材表面越光滑,沉积的Ni_(79)Fe_(21)膜的表面粗糙度和材料矫顽力越小。该研究表明,基底表面的光滑度和均匀性是电镀过程中要考虑的重要参数。在这样的考虑下,已经通过在Cu衬底表面上溅射Cu层来沉积Ni_(81)Fe_(19)Cu复合线以提高Cu线表面的光滑度和均匀性。发现通过溅射的Cu层,沉积的Ni_(81)Fe_(19)/ Cu复合线的GMI效应显着提高。

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