Influence of Chemical Structrue of Isophthaloyl Dichloride and Aliphatic, Cycloaliphatic, and Aromatic Diamine Compound Polyamides on Their Chlorine Resistance

摘要

The influence of teh chemical structrues of the polyamides on chlorine resistance was studied by measuring their chlorine uptake rates. They were prepared from isophthaloyl dichloride and aliphatic, cycloaliphatic, or aromatic diamines by the solution or interfactial polycondensation method. This study showed that the chlorine resistance was dependent on teh chemical structrues of the diamine compounds used in the synthesis of the polyamides. We concluded that the polyamides comprising the diamine components with te following chemical structures had higher chlorine resistance: aliphatic or cycloaliphatic diamien compounds with a secondary amino group, aliphatic or cycloaliphatic diamine compounds with a shorter methylene chain length between end amino grous, and aromatic diamine compounds with methyl or chlorine substituents at the ortho position of the amino groups. Chlorine resistance is related to the basicity of the aliphatic and aromatic diamines used.