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首页> 外文期刊>Journal of Applied Crystallography >A novel comparative study of crystalline perfection and optical homogeneity in Nd:GGG crystals grown by the Czochralski technique with different crystal/melt interface shapes
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A novel comparative study of crystalline perfection and optical homogeneity in Nd:GGG crystals grown by the Czochralski technique with different crystal/melt interface shapes

机译:通过Czochralski技术生长的具有不同晶体/熔体界面形状的Nd:GGG晶体的晶体完善性和光学均匀性的新颖比较研究

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Nd:GGG crystals (GGG is gadolinium gallium garnet) grown with different crystal/melt interface shapes (convex/flat/concave) by varying the seed rotation rate while using the Czochralski technique were studied for their optical homogeneity and crystalline perfection by optical polarization microscopy (OPM) and high-resolution X-ray diffractometry (HRXRD), respectively. It was found that there is a remarkable effect of seed rotation rate, which decides the shape of the crystal/melt interface, on the optical homogeneity and crystalline perfection. It was found experimentally that, as the rotation rate increases, the crystal/melt interface changes from convex to flat. If the rate further increases the interface becomes concave. With a steep convex interface (for low rotation rates), certain facets are concentrated in the small central portion of the crystal, and as the rate increases, these facets slowly move outward, leading to improved optical homogeneity and crystalline perfection as observed from the OPM and HRXRD results. The strain developed in the crystalline matrix as a result of segregation of oxygen in the crystals at low seed rotation rates as observed from HRXRD seems to be the reason for the observed optical inhomogeneity. The correlation between optical inhomogeneity and crystalline perfection for a variety of specimens with different shapes of the crystal/liquid interface obtained at different seed rotation rates is reported.
机译:Nd:GGG晶体(GGG是g镓石榴石),通过改变种子旋转速率,以不同的晶体/熔体界面形状(凸/平/凹)生长,同时使用切克劳斯基技术研究了它们的光学均匀性和光学偏振显微镜的晶体完美性(OPM)和高分辨率X射线衍射仪(HRXRD)。发现晶种旋转速率对光学均匀性和晶体完美度有显着影响,晶种旋转速率决定了晶体/熔体界面的形状。实验发现,随着转速的增加,晶体/熔体界面从凸面变为平坦。如果速率进一步增加,则界面将变为凹形。具有陡峭的凸面界面(用于低旋转速率),某些切面集中在晶体的较小中央部分,并且随着速率的增加,这些切面缓慢向外移动,从而从OPM中观察到改善了光学均匀性和晶体完美度和HRXRD结果。从HRXRD观察到,在低种子旋转速率下,氧在晶体中的偏析导致晶体基质中产生应变,这似乎是观察到的光学不均匀性的原因。报道了在不同种子旋转速率下获得的具有不同晶体/液体界面形状的各种标本的光学不均匀性与晶体完美度之间的相关性。

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