Application de la reflectometrie des rayons X a l'etude de l'oxydation des metaux a haute temperature

摘要

The oxidation of materials is a longtime studied problem since its important economic consequences. Nowadays, X-ray reflectometry is often used to characterize the structure of low-dimension systems. For this reason, we developed the application of X-ray reflectometry for the study of high temperature oxidation. The evaluation of the possibilities and also the limits of he application of these technique were studied. We show that X-ray reflectometry is well adapted to study thin films and so to investigate the temperature oxidation. The study of the growth of the oxyde film in real time and also ex-situ allowed us to investigate the oxidation kinetics in its initial phase and so to verify the different oxidation theories starting from experimental kinetic laws. To conclude, thin work allowed us to adapt the X-ray reflectometry technique to the study of high temperature oxidation of materials. We have shown that this technique is a promising tool for the study of the oxidation in its initial phase.