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首页> 外文期刊>JETP Letters >Population inversion of the energy levels of erbium ions induced by excitation transfer from the semiconductor matrix in Si-Ge based structures
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Population inversion of the energy levels of erbium ions induced by excitation transfer from the semiconductor matrix in Si-Ge based structures

机译:Si-Ge基结构中由半导体基体的激发转移引起的离子能级的粒子数反转

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摘要

Population inversion of the energy levels of Er3+ ions in Si/Si1 - xGex:Er/Si (x = 0.28) structures has been achieved due to electron excitation transfer from the semiconductor matrix. An analysis of the photoluminescence kinetics at a wavelength of 1.54 mu m shows that up to 80% of the Er3+ ions are converted into excited states. This effect, together with the high photoluminescence intensity observed in the structures studied, shows good prospects for obtaining lasers compatible with planar silicon technology. (C) 2005 Pleiades Publishing, Inc.
机译:由于来自半导体基体的电子激发转移,实现了Si / Si1-xGex:Er / Si(x = 0.28)结构中Er3 +离子能级的种群反转。对波长为1.54μm的光致发光动力学的分析表明,高达80%的Er3 +离子转化为激发态。这种效应,以及在所研究的结构中观察到的高光致发光强度,显示出获得与平面硅技术兼容的激光器的良好前景。 (C)2005年Pleiades Publishing,Inc.

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