The photoinduced surface-relief-grating formation behavior of side-chain azo polymers with narrow M_r distribution

摘要

Surface-relief-grating formation induced by Ar~+ laser irradiation was studied using two series of side-chain azo polymers with narrow M_r distribution. The methacrylate-based azo polymers were synthesized using an approach that combined atom transfer radical polymerization and post-polymerization azo-coupling. The azo polymers were characterized using spectroscopic methods, GPC measurement as well as thermal analysis. The surface-relief-grating formation behavior of the azo polymers was examined by irradiating thin polymer films with interfering Ar~+ laser beams. Whilst the M_r of the two polymers had no effect upon surface-relief-grating inscription rate, in contrast, different rates of grating formation and modulation depths were observed for the two polymers.