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Electrical and photocurrent analysis of Si-fluorine doped DLC films heterojunctions

机译:硅氟掺杂DLC薄膜异质结的电和光电流分析

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In this work fluorinated DLC films have been deposited in a reactive RF magnetron sputtering system with different concentrations of CF_4 on p-type Si substrates. The effects of fluorine concentration at growth conditions have been studied by electrical DC measurements and photoconductivity. The electrical DC data reveals a Space Charge Limited Current with an activation energy ranging from 50 meV to 140 meV. The photocurrent in the visible region can increase up to two orders of magnitude compared with dark conditions, and dependent on fluorine concentration at growth conditions. The typical photocurrent densities under reverse bias are about 20-40 mA/cm~2. Discreet photoconductivity shows the influence of two contributions, one in the blue-green region (2.4-2.5 eV) and another in the red-near IR region (1.6 eV). Both appear to be dependent on fluorine concentration at DLC growth, especially the last one.
机译:在这项工作中,氟化DLC膜已在p型Si衬底上以不同浓度的CF_4沉积在反应RF磁控溅射系统中。氟浓度在生长条件下的影响已通过直流电测量和光电导性进行了研究。直流电数据显示空间电荷受限电流,其激活能量为50 meV至140 meV。与黑暗条件相比,可见光区域的光电流最多可以增加两个数量级,并且取决于生长条件下的氟浓度。反向偏压下的典型光电流密度约为20-40 mA / cm〜2。谨慎的光电导性显示了两种影响,一种在蓝绿色区域(2.4-2.5 eV),另一种在近红色红外区域(1.6 eV)。两者似乎都取决于DLC生长时的氟浓度,尤其是最后一个。

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