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Comparison of diamond-like carbon films synthesized by 2.45 GHz microwave and 13.56 MHz multi-jet radiofrequency plasma sources

机译:比较由2.45 GHz微波和13.56 MHz多喷射射频等离子体源合成的类金刚石碳膜

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Diamond-like carbon films (DLC) were grown by two different plasm deposition systems: the RF-MW system employing a radio frequency (RF) powered substrate holder with an additional 2.45 GHz slot antenna (SLAN) microwave (MW) plasma source and the RF-RF system employing a RF powered substrate holder with an additional RF (13.56 MHz) jet matrix plasma source (JeMPS). Helium and methane were used as carrier gas and carbon source, respectively. When operating the RF-MW system, ion densities approached 4 * 10~(10) cm~(-3). Because of the large working distance used in our experiments the MW plasma did not contribute significantly to the charged particle density. In the RF-RF system substantially higher ion concentrations of up to 1.6 * 10~(11) cm~(-3) were measured. Optical and structural properties of the coatings deposited were compared using ellipsometry, Raman spectroscopy and Fourier transform infrared (FTIR). When depositing with the RF-MW system a gradual and controllable change from polymer-like to DLC-based films with increasing substrate RF-power was obtained. This is reflected by a refractive index variation from 1.6 to 2.1. Furthermore, the film growth rates decreased with increasing RF-bias. Typical growth rates were 30 nm min~(-1) at -400 to -500 V bias. A similar change of the films deposited in the RF-RF system was not observed. Instead, DLC films were produced in all cases. The growth rate peaked at 70-80 nm min~(-1) when using -350 to -450 V bias. The refractive index (at λ = 632 nm) and Vickers hardness were approximately 2.3 and 30 GPa, respectively.
机译:类金刚石碳膜(DLC)是通过两种不同的等离子体沉积系统生长的:RF-MW系统采用射频(RF)供电的基板支架以及额外的2.45 GHz缝隙天线(SLAN)微波(MW)等离子体源, RF-RF系统采用RF供电的基板支架以及额外的RF(13.56 MHz)喷射矩阵等离子体源(JeMPS)。氦气和甲烷分别用作载气和碳源。在运行RF-MW系统时,离子密度接近4 * 10〜(10)cm〜(-3)。由于我们的实验中使用了较大的工作距离,因此MW等离子体对带电粒子密度没有显着贡献。在RF-RF系统中,测得的离子浓度基本上更高,高达1.6 * 10〜(11)cm〜(-3)。使用椭圆偏振光度法,拉曼光谱和傅立叶变换红外光谱(FTIR)对沉积的涂层的光学和结构性质进行了比较。当使用RF-MW系统进行沉积时,随着基材RF功率的增加,获得了从聚合物状薄膜到DLC基薄膜的逐渐且可控的变化。折射率从1.6到2.1的变化反映了这一点。此外,膜的生长速率随着RF偏置的增加而降低。在-400至-500 V偏压下,典型的生长速率为30 nm min〜(-1)。没有观察到沉积在RF-RF系统中的膜的类似变化。相反,在所有情况下都生产DLC膜。当使用-350至-450 V偏压时,生长速率在70-80 nm min〜(-1)达到峰值。折射率(在λ= 632 nm时)和维氏硬度分别约为2.3和30 GPa。

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