Plasma etching carbon nanotube arrays and the field emission properties

摘要

We study the morphologies and the field emission properties of carbon nanotube (CNT) arrays grown on silicon Substrate before and after AI- and O_2 plasmas etching. The CNT arrays are synthesized by chemical vapor deposition of ethylene and argon gases in the presence of iron catalysts. Plasma etching is carried out in a DC magnetron-sputtering apparatus. After the treatmeiit, a novel structure of needle-shaped bundles on the surface of CNT arrays is obtained, whose morphologies will be quite different under varied conditions. Enhanced field emission properties are observed after proper treatment.