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Surface and structural properties of ultrathin diamond-like carbon coatings

机译:类金刚石薄碳涂层的表面和结构性能

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Nanoscale wear resistance, friction, and electrical conduction tests using atomic force microscope (AFM) have been conducted on ultrathin diamond-like carbon (DLC) coating, including tetrahedral amorphous carbon (ta-C) deposited using polsed cathodic arc (PCA) and filtered-PCA, and hydrogenated amorphous carbon (a-C:H) deposited using electron cyclotron resonance-chemical vapor deposition (ECR-CVD). The low-resistnat layers at the deposition methods and does not show an obvious variation with the coating thickness decreasing from tens of nm to a few nm. The approx3 nm to-C coatings from PCA and filteredcoating from ECR-CVD had the extremely low load-carrying capacity and exhibited the evidence of coating delamination, which can be related to the thicker (1.5 +-0.1 nm) soft surface layers of a-C:H coating. The results from conducting-AFM measurements indicate that a-C:H coatings have H and sp~3 C enrichment surface layers while the soft surface layers of ta-C coatings have lateral force microscope. The lower friction coefficients of these thin ta-C coatings can be attributed to the existence of graphite-kike surface structure.
机译:已使用原子力显微镜(AFM)对超薄类金刚石碳(DLC)涂层进行了纳米级的耐磨性,摩擦和电导测试,包括使用极化阴极电弧(PCA)沉积并过滤的四面体非晶碳(ta-C) -PCA,以及使用电子回旋共振化学气相沉积(ECR-CVD)沉积的氢化非晶碳(aC:H)。沉积方法中的低电阻层没有显示出明显的变化,涂层厚度从几十纳米减小到几纳米。 PCA的约3 nm to-C涂层和ECR-CVD的滤膜具有极低的承载能力,并显示出涂层分层的迹象,这可能与aC的较厚(1.5 + -0.1 nm)软表面层有关:H涂层进行AFM测量的结果表明,a-C:H涂层具有H和sp〜3 C富集表面层,而ta-C涂层的软表面具有横向力显微镜。这些薄的ta-C涂层的较低的摩擦系数可归因于存在石墨状的表面结构。

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