The subimplantation model for diamond-like carbon films deposited by methane gas decomposition

摘要

In this work, the formation of hard a-C:H films deposited on the cathode of an r.f. sputtering system through the decomposition of methane gas was explained using the sub-implantation model. Even though in a r.f. plasma deposition the ionsstriking the films surface are not mono-energetic, the stress data match the theoretical model proposed by C.A. Davis. The stress versus bias plot shows a behavior similar to those already obtained for ta-C and ta-C:H films, which are prepared usingmono-energetic ion beam.