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Effect of temperature on sulfur-doped diamond-like carbon films deposited by pulsed laser ablation

机译:温度对脉冲激光烧蚀沉积硫掺杂类金刚石碳膜的影响

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In this study, S-DLC films were deposited using pulsed laser ablation of a novel sulfur-graphite (SG) mixture target using an ArF excimer laser (193 nm). The SG targets were made by mixing sulfur and graphite powders at different sulfur molar percentages from 0% to 25%. The S-DLC films were deposited at room temperature, 150 °C and 250 °C. The optical and electronic properties of the doped films were studied. Laser Raman spectroscopy indicated increased graphitic behavior with temperature but decreased with higher sulfur content. Spectroscopic ellipsometry analyses found that the optical band-gap energy, extinction coefficient and reflective index, clearly depended on deposition temperature and sulfur content.
机译:在这项研究中,使用ArF准分子激光(193 nm)对新型硫-石墨(SG)混合靶进行脉冲激光烧蚀来沉积S-DLC膜。 SG目标是通过将硫粉和石墨粉以0%到25%的不同硫摩尔百分比混合而制成的。 S-DLC膜在室温,150°C和250°C下沉积。研究了掺杂薄膜的光学和电子性能。激光拉曼光谱表明,石墨行为随温度升高而增加,但随着硫含量的增加而降低。椭圆偏振光谱分析发现,光学带隙能量,消光系数和反射指数显然取决于沉积温度和硫含量。

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