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LARGE-AREA SECONDARY EMISSION ELECTRON GUN

机译:大面积二次发射电子枪

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摘要

A high current electron beam processor, using secondary emission electrons from a cold cathode by striking helium ions, has been developed for industrial applications. The helium ions are extracted, through a honeycomb partition, from 10 x 70 cm of a discharge chamber where the plasma is generated by a glow-discharge using the wire-anode of 74 cm length and are accelerated toward a cathode biased at -250 kV. The secondary electrons emitted from the cathode are accelerated in the inverse direction to ions and pass through the plasma chamber. It was demonstrated that a current of 200 mA was extracted into the air through a thin window foil and irradiated running products. The dose uniformity on the products was +/-5% over the 65 cm width of the beam area. Processing capacities were up to about 500 Mrad . m/min. The characteristics of this gun will be discussed. Copyright (C) 1996 Published by Elsevier Science Ltd. [References: 10]
机译:已经开发出一种高电流电子束处理器,其利用来自冷阴极的氦离子撞击来发射二次电子,已用于工业应用。氦离子通过蜂窝状隔板从10 x 70 cm的放电室中提取,在该放电室中,使用74 cm长的线状阳极通过辉光放电产生等离子体,并向偏向-250 kV的阴极加速。从阴极发射的二次电子在与离子相反的方向上加速并穿过等离子体室。结果表明,有200 mA的电流通过薄的窗箔被吸入空气中,并受到辐照。产品上的剂量均匀度在光束区域65厘米的宽度上为+/- 5%。处理能力高达500 Mrad。米/分将讨论这把枪的特性。版权所有(C)1996,由Elsevier Science Ltd.发布[参考:10]

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