首页> 外文期刊>Zeitschrift fur Anorganische und Allgemeine Chemie >CuPrOS: No impressive acronym, rather a real quaternary chalcogenide with stuffed PbFCl-type crystal structure [German]
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CuPrOS: No impressive acronym, rather a real quaternary chalcogenide with stuffed PbFCl-type crystal structure [German]

机译:CuPrOS:没有令人印象深刻的首字母缩写,而是具有填充的PbFCl型晶体结构的真正的四级硫族化物[德国]

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摘要

During attempts to synthesize copper(I) praseodymium(III) disulfide (CuPrS2) from 1:1:2-molar mixtures of the elements (Cu, Pr and S) after seven days at 850 degreesC in sealed evacuated silica tubes the almost quantitative formation of the quaternary chalcogenide CuPrOS indicated that some massive oxygen-contaminant (most probably surface-oxidized praseodymium metal) must have been present. The unexpected product becomes even single-crystalline and emerges as yellowish green transparent platelets with square cross-section when equimolar amounts of CsCl; work as fluxing agent. The crystal structure of CuPrOS (tetragonal, P4mm; a = 394.19(4), c = 843.98(9) pm; c/a = 2.141, Z = 2) can be described as an anionic PbFCl-type arrangement according to (2)(infinity){[(Pr3+)(O2-)(4/4)(S2-)(4/4)](-)} with Pr3+ in square-antiprismatic coordination of four F- and four S2- anions which is "stuffed" by Cu+ cations within tetrahedral interstices between the S2- double layers for charge balance. Another description emphasizes two kinds of layers (anionic (2)(infinity){[(Cu+)(S2-)(4/4)](-)} and cationic (2)(infinity){[O2-)(Pr3+)(4/4)](+)} ones) consisting of condensed [(Cu+)(S2-)(4)](7-) and [(O2-)(Pr3+)(4)](10+) tetrahedra, respectively, each of which share four of their six edges. Both types of square layers exhibit the same topology and are alternatingly sheethed parallel (001). The most important internuclear distances range from 233 (d(O-Pr), 4x) via 243 (d(Cu-S), 4x) up to 320 pm (d(Pr-S), 4x). [References: 18]
机译:在密封的真空石英管中于850℃下经过7天后,由1:1:2摩尔的元素(Cu,Pr和S)的混合物合成二硫化铜(I)(CuPrS2)的过程中季铵化物CuPrOS的图谱表明必须存在一些块状氧污染物(最可能是表面氧化的金属)。当等摩尔量的CsCl出现时,意想不到的产物甚至变为单晶,并呈现出带正方形横截面的黄绿色透明片状。作为助焊剂。 CuPrOS的晶体结构(四方,P4 / nmm; a = 394.19(4),c = 843.98(9)pm; c / a = 2.141,Z = 2)可描述为根据( 2)(Infinity){[(Pr3 +)(O2-)(4/4)(S2-)(4/4)](-)}与Pr3 +在四个F-和四个S2-阴离子的方形反棱柱配位中在S2-双层之间的四面体间隙中被Cu +阳离子“填充”,以实现电荷平衡。另一种描述强调了两种类型的层(阴离子(2)(无穷大){[(Cu +)(S2-)(4/4)](-)}和阳离子(2)(无穷大){[O2-](Pr3 +) (4/4)](+)}个,由缩合的[(Cu +)(S2-)(4)](7-)和[(O2-)(Pr3 +)(4)](10+)四面体组成,分别具有六个边缘中的四个边缘。两种类型的正方形层都显示相同的拓扑,并且交替平行地平铺(001)。最重要的核间距范围为233(d(O-Pr),4x)至243(d(Cu-S),4x)至320 pm(d(Pr-S),4x)。 [参考:18]

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